電子束蒸鍍設備（E-Beam Systems）
電子束蒸發系統提供兩種不同的配置:
NANO-MASTER提供組合式蒸發系統使用基板掩蔽和計算機控制蒸發速率。
功能說明
Lift Off
Optical Coatings
Thin Film Transistors
Active CIGS layer
Josephson Junctions
Optical Coatings
Thin Film Transistors
Active CIGS layer
Josephson Junctions
規格說明
Electropolished 14” cubical or 21”x21”x22” 304L SS chamber
5x10-7 Torr base pressure attained with turbomolecular pumping package
4x 15cc pocket E-gun
Source and substrate shutters
6kW and 10kW switching power supply
Automatic pocket indexing
Programmable sweep controller
26” x 44” footprint with SS panels for Class 100 cleanrooms
Quartz crystal thickness sensor
Substrate rotation
LabVIEW user interface
EMO protection and safety interlocks
5x10-7 Torr base pressure attained with turbomolecular pumping package
4x 15cc pocket E-gun
Source and substrate shutters
6kW and 10kW switching power supply
Automatic pocket indexing
Programmable sweep controller
26” x 44” footprint with SS panels for Class 100 cleanrooms
Quartz crystal thickness sensor
Substrate rotation
LabVIEW user interface
EMO protection and safety interlocks
其他說明1
Option
Substrate heating up to 800°C or cooling
Glancing Angle Deposition (GLAD) with rotation
Planetary substrate holder
Substrate RF/DC bias
Dual e-beam source for co-evaporation
Ion source for substrate cleaning and ion assisted evaporation
Additional PVD sources (thermal, sputtering)
MFC’s for reactive evaporation
Automatic load/unload
Substrate heating up to 800°C or cooling
Glancing Angle Deposition (GLAD) with rotation
Planetary substrate holder
Substrate RF/DC bias
Dual e-beam source for co-evaporation
Ion source for substrate cleaning and ion assisted evaporation
Additional PVD sources (thermal, sputtering)
MFC’s for reactive evaporation
Automatic load/unload
