電漿輔助化學氣相沉積系統（PECVD Systems）
PECVD系統能夠沉積高品質的SiO2、Si3N4、CNT、DLC或SiC薄膜。根據應用，可使用RF噴頭、中空陰極、ICP或微波電漿源。
平臺可以容納高達8英寸的晶圓，並可以通過RF、脈衝DC或DC偏置，同時使用電阻或IR燈加熱高達 800°C。
採用250 l/sec渦輪分子泵和5 cfm機械泵將室壓降至5x10-7 Torr壓力範圍。
系統採用LabVIEW PC控制進行全自動化。
平臺可以容納高達8英寸的晶圓，並可以通過RF、脈衝DC或DC偏置，同時使用電阻或IR燈加熱高達 800°C。
採用250 l/sec渦輪分子泵和5 cfm機械泵將室壓降至5x10-7 Torr壓力範圍。
系統採用LabVIEW PC控制進行全自動化。
功能說明
Encapsulation, isolation
Photonic structures
DLC's coating
CNT's - Memory devices
Surface passivation layer - Solar cells
Graphene - Nano scale electronics
Photonic structures
DLC's coating
CNT's - Memory devices
Surface passivation layer - Solar cells
Graphene - Nano scale electronics
規格說明
13" Al chamber or 14" SS cube chamber
5x10-7 Torr base pressure attained with turbo pumping package
Plasma sources: RF showerhead, ICP, hollow cathode and microwave
Gas ring for precursors and gases
Platen: 200°C to 800°C, rotating, biasable with RF, low frequency RF, DC, and pulsed DC
MFC's with electropolished gas lines and pneumatic shut-off valves
Fully automated PC based, recipe driven
LabVIEW user interface
EMO protection and safety interlocks
5x10-7 Torr base pressure attained with turbo pumping package
Plasma sources: RF showerhead, ICP, hollow cathode and microwave
Gas ring for precursors and gases
Platen: 200°C to 800°C, rotating, biasable with RF, low frequency RF, DC, and pulsed DC
MFC's with electropolished gas lines and pneumatic shut-off valves
Fully automated PC based, recipe driven
LabVIEW user interface
EMO protection and safety interlocks
其他說明1
Option
ICP source for high density plasma
Substrate Pulsed DC bias
Substrate LF bias for film stress control
Rotating platen for coating 3D parts
Auto Load/Unload
Dry Pump
Bubblers for Organo-metallics with heated gas lines
Gas box for toxics gases with toxic gas monitors
End point detection
Various dopants (PH3, B2H6)
ICP source for high density plasma
Substrate Pulsed DC bias
Substrate LF bias for film stress control
Rotating platen for coating 3D parts
Auto Load/Unload
Dry Pump
Bubblers for Organo-metallics with heated gas lines
Gas box for toxics gases with toxic gas monitors
End point detection
Various dopants (PH3, B2H6)
