熱蒸鍍系統（Thermal Evaporation Systems）
NANO-MASTER的NTE-3000是一個PC控制的桌上型熱蒸鍍系統，廣泛應用於有機和金屬蒸鍍。它是一個2kVA系統，利用SCR電路進行準確的溫度控制，這在蒸鍍有機材料時非常重要。它的設計非常謹慎，以實現在小的占地面積上進行乾淨、均勻和可重複的工作。它提供了低成本、高品質的功能，滿足研發和小規模生產中的苛刻應用需求。
NTE-4000是NTE-3000熱蒸鍍系統的獨立版本，可為其他選項提供更多的空間，例如不同的腔室尺寸、基板清潔和冷卻、共蒸鍍和濺鍍能力。
NTE-4000是NTE-3000熱蒸鍍系統的獨立版本，可為其他選項提供更多的空間，例如不同的腔室尺寸、基板清潔和冷卻、共蒸鍍和濺鍍能力。
功能說明
12" Bell Jar / Cylindrical 10" SS / Cubical 14" SS chamber
Up to 7"x7" plates and 200mm wafers
Two evaporation sources
Water cooled feedthrus
Solid state switching for sequential evaporation
SCR circuitry for accurate control
Individual source and substrate shutters
Cross contamination shields
Quartz crystal thickness sensor
Twist lock mechanism for easy substrate holder load/unload
Substrate rotation
Closed loop evaporation control
Fully automated PC based, recipe driven
LabVIEW user interface
EMO protection and safety interlocks
Up to 7"x7" plates and 200mm wafers
Two evaporation sources
Water cooled feedthrus
Solid state switching for sequential evaporation
SCR circuitry for accurate control
Individual source and substrate shutters
Cross contamination shields
Quartz crystal thickness sensor
Twist lock mechanism for easy substrate holder load/unload
Substrate rotation
Closed loop evaporation control
Fully automated PC based, recipe driven
LabVIEW user interface
EMO protection and safety interlocks
規格說明
12" Bell Jar / Cylindrical 10" SS / Cubical 14" SS chamber
Up to 7"x7" plates and 200mm wafers
Two evaporation sources
Water cooled feedthrus
Solid state switching for sequential evaporation
SCR circuitry for accurate control
Individual source and substrate shutters
Cross contamination shields
Quartz crystal thickness sensor
Twist lock mechanism for easy substrate holder load/unload
Substrate rotation
Closed loop evaporation control
Fully automated PC based, recipe driven
LabVIEW user interface
EMO protection and safety interlocks
Up to 7"x7" plates and 200mm wafers
Two evaporation sources
Water cooled feedthrus
Solid state switching for sequential evaporation
SCR circuitry for accurate control
Individual source and substrate shutters
Cross contamination shields
Quartz crystal thickness sensor
Twist lock mechanism for easy substrate holder load/unload
Substrate rotation
Closed loop evaporation control
Fully automated PC based, recipe driven
LabVIEW user interface
EMO protection and safety interlocks
其他說明1
Options
Substrate heating up to 800°C or chilled wafer cooling
Glancing Angle Deposition (GLAD) with rotation
Planetary substrate holder
Additional power module for co-evaporation
Additional evaporation sources up to six
RF/DC bias
Ion source for substrate cleaning
Magnetron source for sputtering
MFCs for reactive sputtering/evaporation
Automatic load/unload
Various pumping options including cryo pumping stations
Substrate heating up to 800°C or chilled wafer cooling
Glancing Angle Deposition (GLAD) with rotation
Planetary substrate holder
Additional power module for co-evaporation
Additional evaporation sources up to six
RF/DC bias
Ion source for substrate cleaning
Magnetron source for sputtering
MFCs for reactive sputtering/evaporation
Automatic load/unload
Various pumping options including cryo pumping stations
