PA-MOCVD 系統
NANO-MASTER 開發了世界上第一個桌面型電漿輔助金屬有機化學氣相沉積 (PA-MOCVD) 系統，用於 GaN、InGaN 和 AlGaN 沉積過程。在這種獨特的系統中，使用 N2 作為氮化物生長的電漿源，取代了 NH3，因此消除了 NH3 的排放問題，降低了薄膜中 H2 的含量。通過 RF 雨淋式電漿源的電漿體增強也可以實現更低的沉積溫度 (600°C vs 1100°C)。
III-V Semiconductor layers
Blue LEDs
Laser Diodes
InN Nanorods in UV-Vis-IR optoelectronics
MoS2, BN and Graphene in 3D and 2D materials
Blue LEDs
Laser Diodes
InN Nanorods in UV-Vis-IR optoelectronics
MoS2, BN and Graphene in 3D and 2D materials
Table top system
10" SS chamber
RF plasma source with shower head gas distribution
Auto tuner
4" Substrate holder, heated up to 900°C
Five bubblers with individual cooling/heating baths
Heated gas lines
Additional MFC’s
250l/s turbomolecular pumping package
5x10-7 torr base pressure
Fully automated PC based, recipe driven
LabVIEW user interface
EMO protection and safety interlocks
10" SS chamber
RF plasma source with shower head gas distribution
Auto tuner
4" Substrate holder, heated up to 900°C
Five bubblers with individual cooling/heating baths
Heated gas lines
Additional MFC’s
250l/s turbomolecular pumping package
5x10-7 torr base pressure
Fully automated PC based, recipe driven
LabVIEW user interface
EMO protection and safety interlocks
Options
Stand alone system
ICP or microwave plasma source
14" SS electropolished cubical chamber
8" or 12" substrate holder
700°C rotating substrate holder for 6" platen and 950°C for 4" platen
Additional Bubblers and MFCs
Auto Load/Unload
Cluster configuration compatibility
Stand alone system
ICP or microwave plasma source
14" SS electropolished cubical chamber
8" or 12" substrate holder
700°C rotating substrate holder for 6" platen and 950°C for 4" platen
Additional Bubblers and MFCs
Auto Load/Unload
Cluster configuration compatibility
