Dry Cleaning
Plasma Ashing Systems
ANO-MASTER的電漿清潔和灰化系統旨在滿足從晶圓去除膠片到批量和單晶片載入表面改質的廣泛需求。這些由PC控制的系統具有各種電漿源、加熱和非加熱基板夾持器，以及從電漿蝕刻模式切換到RIE蝕刻模式的獨特能力。
ANO-MASTER的電漿清潔和灰化系統旨在滿足從晶圓去除膠片到批量和單晶片載入表面改質的廣泛需求。這些由PC控制的系統具有各種電漿源、加熱和非加熱基板夾持器，以及從電漿蝕刻模式切換到RIE蝕刻模式的獨特能力。
Delayering for failure analysis
Removal of organic and inorganic materials without residues
Photoresist stripping or ashing
Desmearing and etch back
Cleaning microelectronics, drilled holes on circuit coards or Cu lead frames
Adhesion promotion, elimination of bonding issues
Surface modification of plastics: O2 treatment for paintability
Producing hydrophilic or hydrophobic surfaces
Removal of organic and inorganic materials without residues
Photoresist stripping or ashing
Desmearing and etch back
Cleaning microelectronics, drilled holes on circuit coards or Cu lead frames
Adhesion promotion, elimination of bonding issues
Surface modification of plastics: O2 treatment for paintability
Producing hydrophilic or hydrophobic surfaces
Stainless Steel, Aluminum or Bell Jar Chambers
Class 100 cleanroom compatible
Showerhead, ICP or microwave plasma sources
Rotating platen
250 l/sec turbomolecular pump
5x10-7 Torr base pressure
RF biasable heated up to 300°C PID controlled or cooled platen
Fully automated or manual RF tuning
Up to 4 MFC's with electropolished gas lines
PC Controlled Pneumatic Valves
Fully automated PC based, recipe driven
LabVIEW user interface
EMO protection and safety interlocks
Class 100 cleanroom compatible
Showerhead, ICP or microwave plasma sources
Rotating platen
250 l/sec turbomolecular pump
5x10-7 Torr base pressure
RF biasable heated up to 300°C PID controlled or cooled platen
Fully automated or manual RF tuning
Up to 4 MFC's with electropolished gas lines
PC Controlled Pneumatic Valves
Fully automated PC based, recipe driven
LabVIEW user interface
EMO protection and safety interlocks
